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MASKLESS LITHOGRAPHY

Technology

Principle

Our brand-new Smart Print UV (SP-UV) maskless lithography system uses a Digital Micromirror Device (DMD) technology It gives user a straightforward way to move from the design directly to the patterned sample without the use of the standard photomask fabrication.
No needs of photomask means more flexibility, and faster overall fabrication time.

Alignment

SP-UV is equipped with a 385 nm LED source to be compatible with standard g-, h- and i-line photoresists (such as SU-8).
SP-UV also integrates a secondary yellow LED source coupled with a feedback camera for focusing, inspection and alignment procedure.

Resolution

Our quick-release objective technology gives user access to four different writing resolution to combine writing precision and speed.
Our objective range has been carefully selected with a large working distance (up to 3 cm) to make SP-UV compatible with non-standard substrates (non-flat, flexible, thick).

Scientific publications

The Microlight3D maskless lithography technology
was used for the following publications:

Pure edge-contact devices on single-layer-CVD-graphene integrated into a single chipJune 2023

Topological defects at smectic interfaces as a potential tool for the biosensing of living microorganismsJune 2023

Counting DNA molecules on a microchannel surface for quantitative analysisJanuary 2023

Backward Acoustic Waves in Piezoelectric Plates: Possible Application as Base for Liquid SensorsJanuary 2023

Langmuir-Blodgett Films of Arachidic and Stearic Acids as Sensitive Coatings for Chloroform HF SAW SensorsDecember 2022

Selective Topography Directed Cell Adhesion on Spider Silk SurfacesDecember 2022

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